Pekka Laukkanen
peklau@utu.fi ORCID-tunniste: https://orcid.org/0000-0003-4220-985X |
pintatiede; puolijohde; pinnan passivointi; ohutkalvot
Materials physics, semiconductor research, surfaces and interfaces
Pekka Laukkanen obtained his MSc degree in 2000 at Tampere University of Technology in the field of optoelectronics. He completed his PhD thesis in 2005 in the area of surface physics at University of Turku. He is now working at a boundary between surface science and semiconductor technology, trying to improve connection and collaboration between these two fields. His expertise area includes photoelectron spectroscopy, scanning tunneling microscopy, electron diffraction, surface passivation, interface defects, and semiconductor technology.
Our research group has investigated surface properties: chemical, electronic and structural ones of traditional semiconductor crystals including silicon (Si), germanium (Ge), and III-V compound semiconductors (e.g. GaAs, GaN, InAs, InP) by means of electron diffraction (LEED), scanning tunneling microscopy and spectroscopy (STM/STS), and photoelectron spectroscopy (including synchrotron sources). One goal has been to contribute bridging between the fields of surface science and the semiconductor technology. More recently we have focused on the question how to decrease surface-related electrical and optical losses in semiconductor-based devices like capacitors, sensors, solar cells, and transistors. We aim to understand reasons behind formation of defect levels in device surfaces and to find new methods to decrease the amount of defect levels. In order to measure opto-electrical properties, we have learned to manufacture simple devices in clean rooms.
Recently I have teched the following courses at the University of Turku:
- Phases and properties of materials (Aineen olomuodot ja ominaisuudet)
- Electrical properties of solids
- Semiconductors
- Semiconductor spectroscopy (method course)
- Atomic-Level Insights Into the Initial Oxidative Crystallization of Si(100) to Periodic SiOx (2026)
- Advanced theory and simulations
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Effect of H2O2 and H2O immersions on epitaxial GaInP-GaAs interfaces: Photoluminescence and x-ray photoelectron study (2026)
- Applied Surface Science
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - A Detailed Examination of Polysilicon Resistivity Incorporating the Grain Size Distribution (2025)
- IEEE Transactions on Electron Devices
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Area-Dependent Resistive Switching and Interfacial Dynamics in GCMO-Based Memristors (2025)
- ACS applied electronic materials
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Below 1% Reflectance for Black GaAs Surface Prepared by Facile Two-Step Wet Chemical Treatment: Hydrogen Peroxide and Water (2025)
- Advanced photonics research
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Effects of ultra-high vacuum treatments on n-type Si contact resistivity (2025)
- Applied Surface Science
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Passivation of Germanium Surfaces by HF:H2O2 Aqueous Solution (2025)
- physica status solidi (RRL) - Rapid Research Letters
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Potential of ultrahigh-vacuum based surface treatments in silicon technology (2025)
- Microelectronic Engineering
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Surface Properties of p‐GaN and Formation of Nickel Metal Contacts (2025)
- Advanced Materials Interfaces
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Transforming Schottky to Ohmic Contacts via Ultrahigh-Vacuum Engineered Interfacial Alloying (2025)
- ACS Applied Materials and Interfaces
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Bridging the gap between surface physics and photonics (2024)
- Reports on Progress in Physics
(A2 Vertaisarvioitu katsausartikkeli tieteellisessä lehdessä) - Dry cleaning of InSb surfaces by hydrogen molecule exposure in ultrahigh vacuum (2024)
- Applied Surface Science
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Modeling the Influence of Deposition Parameters on the Crystalline Degree in the Simulation of Polycrystalline Silicon (2024)
- physica status solidi (b)
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Polycrystalline silicon, a molecular dynamics study: I. Deposition and growth modes (2024)
- Modelling and Simulation in Materials Science and Engineering
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Polycrystalline silicon, a molecular dynamics study: II. Grains, grain boundaries and their structure (2024)
- Modelling and Simulation in Materials Science and Engineering
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Atomic Level Chemical and Structural Properties of Silicon Surface and Initial Stages of Oxidation (2023)
- Solid State Phenomena
(A4 Vertaisarvioitu artikkeli konferenssijulkaisussa) - Effects of Ultrahigh Vacuum Treatments on Wet Chemically Cleaned Si Surfaces (2023)
- Solid State Phenomena
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Efficient surface passivation of germanium nanostructures with 1% reflectance (2023)
- Nanotechnology
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Plasma-enhanced atomic layer deposited SiO2 enables positive thin film charge and surface recombination velocity of 1.3 cm/s on germanium (2023)
- Applied Physics Letters
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä ) - Properties and modification of native oxides of InP(100) (2023)
- Journal of Physics D: Applied Physics
(A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä )



