Mikko Miettinen
miolmi@utu.fi |
- A Detailed Examination of Polysilicon Resistivity Incorporating the Grain Size Distribution (2025)
- IEEE Transactions on Electron Devices
- Effects of ultra-high vacuum treatments on n-type Si contact resistivity (2025)
- Applied Surface Science
- Passivation of Germanium Surfaces by HF:H2O2 Aqueous Solution (2025)
- physica status solidi (RRL) - Rapid Research Letters
- Dry cleaning of InSb surfaces by hydrogen molecule exposure in ultrahigh vacuum (2024)
- Applied Surface Science
- Modeling the Influence of Deposition Parameters on the Crystalline Degree in the Simulation of Polycrystalline Silicon (2024)
- physica status solidi (b)
- Polycrystalline silicon, a molecular dynamics study: I. Deposition and growth modes (2024)
- Modelling and Simulation in Materials Science and Engineering
- Polycrystalline silicon, a molecular dynamics study: II. Grains, grain boundaries and their structure (2024)
- Modelling and Simulation in Materials Science and Engineering
- Structurally simplified GCMO crossbar design for artificial synaptic networks (2024)
- Applied Physics Letters
- Effects of Ultrahigh Vacuum Treatments on Wet Chemically Cleaned Si Surfaces (2023)
- Solid State Phenomena
- Plasma-enhanced atomic layer deposited SiO2 enables positive thin film charge and surface recombination velocity of 1.3 cm/s on germanium (2023)
- Applied Physics Letters
- Properties and modification of native oxides of InP(100) (2023)
- Journal of Physics D: Applied Physics
- Reversible oxygen-driven c(4 x 4) ↔ (1 x 2) phase transition on the Ba/Ge (100) surface (RETRACTED) (2023)
- Applied Surface Science
- Surface Passivation of Germanium with ALD Al2O3: Impact of Composition and Crystallinity of GeOx Interlayer (2023)
- Crystals
- Wet Chemical Treatment and Mg Doping of p-InP Surfaces for Ohmic Low-Resistive Metal Contacts (2023)
- Advanced Engineering Materials
- Effects of post oxidation of SiO2/Si interfaces in ultrahigh vacuum below 450 °C (2022)
- Vacuum
- Effects of thermal vacuum nitridation of Si(100) surface via NH3 exposure (2022)
- Thin Solid Films