Effects of Ultrahigh Vacuum Treatments on Wet Chemically Cleaned Si Surfaces

: Rad, Zahra Jahanshah; Miettinen, Mikko; Punkkinen, Marko; Laukkanen, Pekka; Kokko, Kalevi; Vähänissi, Ville; Savin, Hele

: Paul Mertens, Antoine Pacco, Kurt Wostyn, Quoc Toan Le

: Ultra Clean Processing of Semiconductor Surfaces

Publisher: Trans Tech Publications Ltd

: 2023

: Solid State Phenomena

: Ultra Clean Processing of Semiconductor Surfaces XVI: Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023)

: Solid State Phenomena

: 346

: 57

: 62

: 978-3-0364-0312-0

: 978-3-0364-1312-9

: 1012-0394

: 1662-9779

DOI: https://doi.org/10.4028/p-zJ2YOT(external)

: https://doi.org/10.4028/p-zJ2YOT(external)

Ultrahigh vacuum (UHV) environment has been widely used in surface science, but UHV technology has been often considered too complex and expensive methodology for large-scale industrial use. Because the preparation of atomically smooth and clean Si surfaces has become relevant to some industrial processes, we have re-addressed the question if UHV could be utilized in these surface tasks using industrially feasible parameters. In particular, we have studied how UHV treatments might be combined with the widely used semiconductor cleaning methodology of wet chemistry.