Pekka Laukkanen
peklau@utu.fi |
surface science; semiconductors, surface passivation, film growth
Materials physics, semiconductor research, surfaces and interfaces
Pekka Laukkanen obtained his MSc degree in 2000 at Tampere University of Technology in the field of optoelectronics. He completed his PhD thesis in 2005 in the area of surface physics at University of Turku. He is now working at a boundary between surface science and semiconductor technology, trying to improve connection and collaboration between these two fields. His expertise area includes photoelectron spectroscopy, scanning tunneling microscopy, electron diffraction, surface passivation, interface defects, and semiconductor technology.
Our research group has investigated surface properties: chemical, electronic and structural ones of traditional semiconductor crystals including silicon (Si), germanium (Ge), and III-V compound semiconductors (e.g. GaAs, GaN, InAs, InP) by means of electron diffraction (LEED), scanning tunneling microscopy and spectroscopy (STM/STS), and photoelectron spectroscopy (including synchrotron sources). One goal has been to contribute bridging between the fields of surface science and the semiconductor technology. More recently we have focused on the question how to decrease surface-related electrical and optical losses in semiconductor-based devices like capacitors, sensors, solar cells, and transistors. We aim to understand reasons behind formation of defect levels in device surfaces and to find new methods to decrease the amount of defect levels. In order to measure opto-electrical properties, we have learned to manufacture simple devices in clean rooms.
Recently I have teched the following courses at the University of Turku:
- Phases and properties of materials (Aineen olomuodot ja ominaisuudet)
- Electrical properties of solids
- Semiconductors
- Semiconductor spectroscopy (method course)
- Initial stages of Yb/Si(100) interface growth: 2x3 and 2x6 reconstructions (2003)
- Applied Surface Science
- Investigation of the surface topography and double layer characteristics of variously pre-treated antimony single crystal electrodes (2003)
- Surface Science
- Ruthenium-modified MCM-41 mesoporous molecular sieve and Y zeolite catalysts for selective hydrogenation of cinnamaldehyde (2003)
- Applied Catalysis A: General
- Scanning tunneling microscopy study of GaAs(100) surface prepared by HCl-isopropanol treatment (2003)
- Applied Surface Science
- Two series of triple- and single-domain reconstructions induced by europium on vicinal Si(111)[112]-miscut surface (2003)
- Applied Surface Science
- Yb, Eu, and (Yb+Eu)-stabilized 3x1 and 3x2 reconstructions on Si(111) (2003)
- Surface Science
- 1.32 um GaInNAs / GaAs laser with a low threshold current density (2002)
- IEEE Photonics Technology Letters
- An effect of vicinal surface morphology on adsorbate structure: Yb growth on [112]-tilt Si(111) (2002)
- Surface Science
- A new heterogeneously catalytic pathway for isomerization of linoleic acid over Ru/C and Ni/H-MCM-41 catalysts (2002)
- Journal of Catalysis
- Enhanced optical and structural properties of strain-compensated 1.3 um GaInNAs / GaNAs / GaAs quantum well laser structures (2002)
- Journal of Crystal Growth
- Structural, electrical, and optical properties of defects in Si-doped GaN grown by molecular-beam epitaxy on hydride vapor phase epitaxy GaN on sapphire (2002)
- Journal of Applied Physics
- Emission studies of InGaN layers and LEDs grown by plasma-assisted MBE (2001)
- Journal of Crystal Growth
- Low threshold current 1.32 um GaInNAs / GaAs single quantum well lasers grown by molecular beam epitaxy (2001)
- Applied Physics Letters
- Growth of gallium nitride films by molecular beam epitaxy (2000) P. Laukkanen
- Plasma-assisted MBE growth of GaN on HVPE-GaN substrates (1999)
- physica status solidi (c)



