Rapid low-temperature processing of metal-oxide thin film transistors with combined far ultraviolet and thermal annealing




J. Leppäniemi, K. Ojanperä, T. Kololuoma, O.-H. Huttunen, J. Dahl, M. Tuominen, P. Laukkanen, H. Majumdar, A. Alastalo

2014

Applied Physics Letters

113514

105

11

5

0003-6951

DOIhttps://doi.org/10.1063/1.4895830




Last updated on 2024-26-11 at 18:30