A1 Refereed original research article in a scientific journal
Fabrication of a thin silicon detector with excellent thickness uniformity
Authors: Valtonen E, Eronen T, Nenonen S, Andersson H, Miikkulainen K, Eranen S, Ronkainen H, Makinen J, Husu H, Lassila A, Punkkinen R, Hirvonen M
Publisher: Elsevier Science BV
Publication year: 2016
Journal: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Journal name in source: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT
Journal acronym: Nucl Instrum Meth A
Volume: 810
First page : 27
Last page: 31
Number of pages: 5
ISSN: 0168-9002
DOI: https://doi.org/10.1016/j.nima.2015.11.124
We have fabricated and tested a thin silicon detector with the specific goal of having a very good thickness uniformity. SOI technology was used in the detector fabrication. The detector was designed to be used as a Delta E detector in a silicon telescope for measuring solar energetic particles in space. The detector thickness was specified to be 20 mu m with an rms thickness uniformity of +/- 0.5%. The active area consists of three separate elements, a round centre area and two surrounding annular segments. A new method was developed for measuring the thickness uniformity based on a modified Fizeau interferometer. The thickness uniformity specification was well met with the measured rms thickness variation of 43 nm. The detector was electrically characterized by measuring the I-V and C-V curves and the performance was verified using a Am-241 alpha source. (C) 2015 Elsevier B.V. All rights reserved.
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