Effects of (NH4)2S and NH4OH surface treatments prior to SiO2 capping on 1.3: GaInAsN/GaAs quantum well structures




Polojärvi V, Salmi J,   Schramm A, Tukiainen A, Guina M, Pakarinen J, Arola E, Lång J, Väyrynen I J, Laukkanen P

2010

 Applied Physics Letters

111109

11

97

11

3

0003-6951

DOIhttps://doi.org/10.1063/1.3487784




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