A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä

Inexpensive substrate heater for oxidizing environments




TekijätPaturi P, Huhtinen H, Laiho R

KustantajaAMER INST PHYSICS

Julkaisuvuosi1998

Lehti:Review of Scientific Instruments

Tietokannassa oleva lehden nimiREVIEW OF SCIENTIFIC INSTRUMENTS

Lehden akronyymiREV SCI INSTRUM

Vuosikerta69

Numero11

Aloitussivu3945

Lopetussivu3947

Sivujen määrä3

ISSN0034-6748

DOIhttps://doi.org/10.1063/1.1149203


Tiivistelmä
We describe a substrate heater constructed for use in an oxidizing environment in the temperature range of T less than or equal to 900 degrees C. The heating element is an ordinary projection lamp working in ambient near the end of a quartz tube fixed with a flange to a vacuum chamber. On the vacuum (outer) side of the tube is a smooth fitting stainless steel cylinder that conducts the heat to the region of the substrate. For fixing or removing the substrate the cylinder can be simply pulled off its position on the quartz tube. The heater that is described has been used, for example, for laser ablation of YBa2Cu3O6+x superconducting films. (C) 1998 American Institute of Physics. [S0034- 6748(98)03911-2].



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