A1 Refereed original research article in a scientific journal

Increased grain boundary critical current density J(c)(gb) by Pr-doping in pulsed laser-deposited Y1-xPrxBCO thin films




AuthorsIrjala M, Huhtinen H, Awana VPS, Falter M, Paturi P

PublisherAMER INST PHYSICS

Publication year2011

JournalJournal of Applied Physics

Journal name in sourceJOURNAL OF APPLIED PHYSICS

Journal acronymJ APPL PHYS

Article numberARTN 113905

Number in series11

Volume110

Issue11

First page 1139051

Last page8

Number of pages-1139042

ISSN0021-8979

DOIhttps://doi.org/10.1063/1.3664773(external)


Abstract
A comparative study has been performed on Pr-doped Y1-xPrxBCO (x = 0 - 0.20) thin films deposited by pulsed laser deposition on MgO and buffered NiW substrates to study the effect of Pr-doping on the grain boundary critical current density (J(c)(gb)). Our earlier work on bulk materials and SrTiO3 substrates indicated that, whereas Pr increases J(c) in bulk samples, it does not increase Jc in film samples without grain boundaries. In this work, we present increased J(c) in low concentrations of Pr3+-doping (x < 0.04) at temperatures above 60K in film samples on MgO substrates and at all temperatures and fields in film samples on buffered NiW substrates. Results indicate that Pr segregates into grain boundary regions, improving the local hole concentration and carrier density, hence, increasing J(c)(gb). (C) 2011 American Institute of Physics. [doi.10.1063/1.3664773]



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