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A prospective submonolayer template structure for integration of functional oxides with silicon




TekijätAveryanov DV, Karateeva CG, Karateev IA, Tokmachev AM, Kuzmin MV, Laukkanen P, Vasiliev AL, Storchak VG

KustantajaELSEVIER SCI LTD

Julkaisuvuosi2017

JournalMaterials and Design

Tietokannassa oleva lehden nimiMATERIALS & DESIGN

Lehden akronyymiMATER DESIGN

Vuosikerta116

Aloitussivu616

Lopetussivu621

Sivujen määrä6

ISSN0264-1275

eISSN1873-4197

DOIhttps://doi.org/10.1016/j.matdes.2016.12.055


Tiivistelmä
Epitaxial integration of oxides with the ubiquitous silicon technological platform promises devices with dreamed-of functionality but is difficult to achieve due to chemical processes at the Si/oxide interface. The standard approach suggests a protective template - a surface superstructure of SrSi(2)stoichiometry; still, only a handful of oxides couple to Si with atomically abrupt interface. We advocate an alternative approach - the use of metal-rich submonolayer templates as a general recipe, in particular, robust 1 x 5 reconstructions of Sr and Eu on Si. Their fail-safe synthesis is reported, diffraction techniques and electron microscopy reveal the structure and thermal stability of the reconstructions. The surface protection is discussed in terms of oxidation kinetics. The advantages of the new templates are demonstrated recruiting the example of the paradigmatic spintronic system EuO/Si. (C) 2016 Elsevier Ltd. All rights reserved.



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