A1 Refereed original research article in a scientific journal
Influence of sequential etching on YBCO films deposited by PLD from a nanostructured target
Authors: Huhtinen H, Raittila J, Paturi P, Huhtala VP, Mattila S, Salminen J
Publisher: IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Publication year: 2003
Journal:: IEEE Transactions on Applied Superconductivity
Journal name in source: IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY
Journal acronym: IEEE T APPL SUPERCON
Volume: 13
Issue: 2
First page : 2777
Last page: 2780
Number of pages: 4
ISSN: 1051-8223
DOI: https://doi.org/10.1109/TASC.2003.812005
Abstract
Thin YBa2Cu3O6+x (YBCO) films with T-c = 90 K and high critical current in the order of 10(7) A/cm(2) at 77 K are prepared with pulsed laser deposition from a nanostructured target. Changes in the superconducting and structural properties of the films are investigated after repeated thinning by Ar-ion sputtering or by electrochemical etching. As shown by Auger depth profiling, the chemical composition is preserved through the film during Ar-ion sputtering while electrochemical etching changes the atomic concentrations and surface structures. Investigations by SQUID magnetometry and by conventional resistivity measurements give evidence that the dependence of T-c on the film thickness is similar to as-prepared ultrathin films. The thickness dependence of J(c) indicates an excess of pinning centers on the surface of the as-deposited film.
Thin YBa2Cu3O6+x (YBCO) films with T-c = 90 K and high critical current in the order of 10(7) A/cm(2) at 77 K are prepared with pulsed laser deposition from a nanostructured target. Changes in the superconducting and structural properties of the films are investigated after repeated thinning by Ar-ion sputtering or by electrochemical etching. As shown by Auger depth profiling, the chemical composition is preserved through the film during Ar-ion sputtering while electrochemical etching changes the atomic concentrations and surface structures. Investigations by SQUID magnetometry and by conventional resistivity measurements give evidence that the dependence of T-c on the film thickness is similar to as-prepared ultrathin films. The thickness dependence of J(c) indicates an excess of pinning centers on the surface of the as-deposited film.
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