Local variation in Bi crystal sites of epitaxial GaAsBi studied by photoelectron spectroscopy and first-principles calculations




P. Laukkanen, M.P.J. Punkkinen, A. Lahti, J. Puustinen, M. Tuominen, J. Hilska, J. Mäkelä, J. Dahl, M. Yasir, M. Kuzmin, J.R. Osiecki, K. Schulte, M. Guina, K. Kokko

PublisherELSEVIER SCIENCE BV

2017

Applied Surface Science

396

688

694

7

0169-4332

1873-5584

DOIhttps://doi.org/10.1016/j.apsusc.2016.11.009



Epitaxial Bi-containing III–V crystals (III-V1-xBix) have attracted increasing interest due to their potential in infrared applications. Atomic-scale characterization and engineering of bulk-like III-V1-xBix properties (e.g., Bi incorporation and defect formation) are challenging but relevant to develop applications. Toward that target, we report here that the traditional surface-science measurement of photoelectron spectroscopy (PES) is a potential, non-destructive method to be combined in the studies of bulk-like properties, when surface effects are properly removed. We have investigated epitaxial GaAs1-xBix films, capped by epitaxial AlAs layers, with high-resolution photoelectron spectroscopy. The Bi5d core-level spectra of GaAs1-xBixtogether with ab-initio calculations give direct evidence of variation of Bi bonding environment in the lattice sites. The result agrees with photoluminescence (PL) measurement which shows that the studied GaAs1-xBix films include local areas with higher Bi content, which contribute to PL but do not readily appear in x-ray diffraction (XRD). The measured and calculated Bi core-level shifts show also that Ga vacancies and Bi clusters are dominant defects.



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