A1 Vertaisarvioitu alkuperäisartikkeli tieteellisessä lehdessä
Integrated on-chip energy storage using passivated nanoporous-silicon electrochemical capacitors
Tekijät: Donald S. Gardner, Charles W. Holzwarth III, Yang Liu, Scott B. Clendenning, Wei Jin, Bum-Ki Moon, Cary Pint, Zhaohui Chen, Eric C. Hannah, Chunhui Chen, Chunlei Wang, Ermei Mäkilä, Ron Chen, Tomm Aldridge, John L. Gustafson
Kustantaja: ELSEVIER SCIENCE BV
Julkaisuvuosi: 2016
Journal: Nano Energy
Tietokannassa oleva lehden nimi: NANO ENERGY
Lehden akronyymi: NANO ENERGY
Vuosikerta: 25
Aloitussivu: 68
Lopetussivu: 79
Sivujen määrä: 12
ISSN: 2211-2855
DOI: https://doi.org/10.1016/j.nanoen.2016.04.016
Tiivistelmä
Integrated on-chip energy storage is increasingly important in the fields of internet of things, energy harvesting, sensing, and wearables; capacitors being ideal for devices requiring higher powers or many thousands of cycles. This work demonstrates electrochemical capacitors fabricated using an electrolyte and porous silicon nanostructures with very high surface-to-volume ratios. Nanopore morphologies and passivation coatings for maximizing energy and power densities of porous-silicon based electrochemical capacitors are studied. Stability is achieved through atomic layer deposition (ALD) titanium nitride or chemical vapor deposition (CVD) carbon coatings. The use of silicon processing methods creates the potential for on-chip energy storage. (C) 2016 Elsevier Ltd. All rights reserved.
Integrated on-chip energy storage is increasingly important in the fields of internet of things, energy harvesting, sensing, and wearables; capacitors being ideal for devices requiring higher powers or many thousands of cycles. This work demonstrates electrochemical capacitors fabricated using an electrolyte and porous silicon nanostructures with very high surface-to-volume ratios. Nanopore morphologies and passivation coatings for maximizing energy and power densities of porous-silicon based electrochemical capacitors are studied. Stability is achieved through atomic layer deposition (ALD) titanium nitride or chemical vapor deposition (CVD) carbon coatings. The use of silicon processing methods creates the potential for on-chip energy storage. (C) 2016 Elsevier Ltd. All rights reserved.
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