A4 Vertaisarvioitu artikkeli konferenssijulkaisussa
Optimization of Pr(0.9)Ca(0.1)MnO(3) thin films with varying in-situ oxygen annealing treatments
Tekijät: T Elovaara, H Huhtinen, S Majumdar, P Paturi
Toimittaja: P Tiberto, M Affronte, F Casoli, C de Julián Fernández, G Gubbiotti, C Marquina, F Pratt, M Solzi, S Tacchi, P Vavassori (Eds. )
Julkaisuvuosi: 2013
Journal: EPJ Web of Conferences
Kokoomateoksen nimi: JEMS 2012 - Joint European Magnetic Symposia
Tietokannassa oleva lehden nimi: JEMS 2012 - JOINT EUROPEAN MAGNETIC SYMPOSIA
Vuosikerta: 40
Aloitussivu: 15011(1)
Lopetussivu: 15011(4)
Sivujen määrä: 4
ISSN: 2100-014X
DOI: https://doi.org/10.1051/epjconf/20134015011
Tiivistelmä
The influence of in situ oxygen annealings on narrow electronic bandwidth Pr0.9Ca0.1MnO3 films are investigated in the complex phase separation region. Measurements by x-ray diffractometry and SQUID magnetometry reveal that relatively high deposition temperature at 700 degrees C relaxes the lattice by twin boundaries while the lower deposition temperature at 500 degrees C with higher post-annealing temperature of 700 degrees C relaxes the substrate induced strain via oxygen absorption and makes the film structure more homogeneous. This behaviour is clearly supported by the decrease of ferromagnetic ordering due to decrease of Mn3+ ions in films oxygen annealed at high temperatures and this phenomenon is widely discussed with the models of double-exchange interaction, trapping of carriers in the oxygen vacancies and formation of magnetic polarons. The results show unambiguously that because the oxygen content tailors many physical properties dramatically, the annealing treatments are in very important role when optimizing these materials for future applications.
The influence of in situ oxygen annealings on narrow electronic bandwidth Pr0.9Ca0.1MnO3 films are investigated in the complex phase separation region. Measurements by x-ray diffractometry and SQUID magnetometry reveal that relatively high deposition temperature at 700 degrees C relaxes the lattice by twin boundaries while the lower deposition temperature at 500 degrees C with higher post-annealing temperature of 700 degrees C relaxes the substrate induced strain via oxygen absorption and makes the film structure more homogeneous. This behaviour is clearly supported by the decrease of ferromagnetic ordering due to decrease of Mn3+ ions in films oxygen annealed at high temperatures and this phenomenon is widely discussed with the models of double-exchange interaction, trapping of carriers in the oxygen vacancies and formation of magnetic polarons. The results show unambiguously that because the oxygen content tailors many physical properties dramatically, the annealing treatments are in very important role when optimizing these materials for future applications.
Turun yliopiston Tutkimustietojärjestelmän portaali